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Wednesday, September 22, 2021

CONTEXT: Extreme Ultraviolet Lithography for Semiconductor Manufacturing, Parts 2 and 3 of 3

Concluding the series on the optical train of an extreme ultraviolet (EUV) system for exposing semiconductor wafers which began with Part 1, Part 2 discusses the properties of state of the art production lithography machines.

Part 3 explores how components of the optical train are manufactured to such demanding precision.

Posted at September 22, 2021 12:41